Compositional dependence of crystallization temperatures and phase evolution in hafnia-zirconia (HfxZr1−x)O2 thin films-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Compositional dependence of crystallization temperatures and phase evolution in hafnia-zirconia (HfxZr1−x)O2 thin films

Published:2020-05-11 Issue:19 Volume:116 Page:192901
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Hsain H. Alex¹^ORCID,Lee Younghwan¹^ORCID,Parsons Gregory²^ORCID,Jones Jacob L.¹^ORCID

Affiliation:

1. Materials Science and Engineering Department, North Carolina State University, 911 Partners Way, Raleigh, North Carolina 27695, USA

2. Chemical and Biomolecular Engineering Department, North Carolina State University, 911 Partners Way, Raleigh, North Carolina 27695, USA

Funder

National Science Foundation

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/am-pdf/10.1063/5.0002835

Reference30 articles.

1. Ultrathin Hf0.5Zr0.5O2 Ferroelectric Films on Si

2. Impact of the TiN electrode deposition on the HfO2 band gap for advanced MOSFET gate stacks

3. Understanding the formation of the metastable ferroelectric phase in hafnia–zirconia solid solution thin films

4. Ten-Nanometer Ferroelectric $\hbox{Si:HfO}_{2}$ Films for Next-Generation FRAM Capacitors

Cited by 66 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Impact of Hafnium Doping on Phase Transition, Interface, and Reliability Properties of Zr_xHf_1–xO₂-Based Capacitors;ACS Applied Electronic Materials;2024-08-15

2. Enhancement of ferroelectricity in chemical-solution-deposited ZrO2 thin films through fine phase transition control;Ceramics International;2024-08

3. Phase Transformations Driving Biaxial Stress Reduction During Wake‐Up of Ferroelectric Hafnium Zirconium Oxide Thin Films;Advanced Electronic Materials;2024-06-21

4. Oxygen diffusion coefficients in ferroelectric hafnium zirconium oxide thin films;Applied Physics Letters;2024-06-17

5. Effects of Deposition Power and Thermal Treatment on Ferroelectric Properties of Sputtered Hf₀.₅Zr₀.₅O₂;IEEE Transactions on Electron Devices;2024-05

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3