Author:
Gaumer C.,Martinez E.,Lhostis S.,Guittet M.-J.,Gros-Jean M.,Barnes J.-P.,Licitra C.,Rochat N.,Barrett N.,Bertin F.,Chabli A.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference30 articles.
1. Advanced high-κ dielectric stacks with polySi and metal gates: Recent progress and current challenges
2. Band offsets of wide-band-gap oxides and implications for future electronic devices
3. Band offsets and Schottky barrier heights of high dielectric constant oxides
4. X. Garros, M. Cassé, G. Reimbold, F. Martin, A. Fanton, O. Renault, V. Cosnier, S. Lhostis, F. Boulanger, Symposium on VLSI Technology and Digest of Technical Papers, 69 (2008).
5. Electron energy-loss spectroscopy analysis of the electronic structure of nitrided Hf silicate films
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