Advanced high-κ dielectric stacks with polySi and metal gates: Recent progress and current challenges-Reference-Cited by-同舟云学术

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Advanced high-κ dielectric stacks with polySi and metal gates: Recent progress and current challenges

Published:2006-07 Issue:4.5 Volume:50 Page:387-410
ISSN:0018-8646
Container-title:IBM Journal of Research and Development
language:
Short-container-title:IBM J. Res. & Dev.

Author:

Gusev E. P.,Narayanan V.,Frank M. M.

Publisher

IBM

Subject

General Computer Science

Link

http://xplorestaging.ieee.org/ielx5/5288520/5388736/05388742.pdf?arnumber=5388742

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