Toward Low-Thermal-Budget Hafnia-Based Ferroelectrics via Atomic Layer Deposition

Author:

Kim Jin-Hyun1ORCID,Onaya Takashi23,Park Hye Ryeon4,Jung Yong Chan1ORCID,Le Dan N.1ORCID,Lee Minjong5,Hernandez-Arriaga Heber1,Zhang Yugang6,Tsai Esther H. R.6,Nam Chang-Yong67ORCID,Nabatame Toshihide3,Kim Si Joon48ORCID,Kim Jiyoung15ORCID

Affiliation:

1. Department of Materials Science and Engineering, The University of Texas at Dallas, 800 West Campbell Road, Richardson, Texas 75080, United States

2. Department of Advanced Materials Science, Graduate School of Frontier Science, The University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa-shi, Chiba 277-8561, Japan

3. National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan

4. Department of BIT Medical Convergence, Kangwon National University, 1 Gangwondaehakgil, Chuncheon, Gangwon-do 24341, Republic of Korea

5. Department of Electrical and Computer Engineering, The University of Texas at Dallas, 800 West Campbell Road, Richardson, Texas 75080, United States

6. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States

7. Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794, United States

8. Department of Electrical and Electronics Engineering, Kangwon National University, 1 Gangwondaehakgil, Chuncheon, Gangwon-do 24341, Republic of Korea

Funder

Ministry of Trade, Industry and Energy

Semiconductor Research Corporation

Korea Institute for Advancement of Technology

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials

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