Stability of ferroelectric and antiferroelectric hafnium–zirconium oxide thin films-Reference-Cited by-同舟云学术

Stability of ferroelectric and antiferroelectric hafnium–zirconium oxide thin films

Published:2020-08-07 Issue:5 Volume:128 Page:054101
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Chae Kisung¹²^ORCID,Hwang Jeongwoon²³,Chagarov Evgueni¹,Kummel Andrew¹,Cho Kyeongjae²^ORCID

Affiliation:

1. Department of Chemistry and Biochemistry, University of California San Diego, 9500 Gilman Dr, La Jolla, California 92093, USA

2. Department of Materials Science and Engineering, The University of Texas at Dallas, 800 W Campbell Rd, Richardson, Texas 75080, USA

3. Department of Physics Education, Chonnam National University, 77 Yongbong-ro, Yongbong-dong, Buk-gu, Gwangju 61186, South Korea

Funder

National Research Foundation of Korea

Semiconductor Research Corporation

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0011547

Reference35 articles.

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