Abstract
Abstract
The significance of hafnia in the semiconductor industry has been amplified following the unearthing of its ferroelectric properties. We investigated the structure and electrical properties of La- and hole-doped HfO2 with/without epitaxial strain by first-principles calculations. It is found that the charge compensated defect with oxygen vacancy (
L
a
H
f
V
O
) and uncompensated defect (
L
a
H
f
), compared to the undoped case, make the ferroelectric orthorhombic
P
c
a
2
1
phase (o phase) more stable. Conversely, the electrons compensated defect (
L
a
H
f
+e) makes the nonpolar monoclinic
P
2
1
/
c
phase (m phase) more stable. Furthermore, both pure hole doping (without ions substituent) and compressive strain can stabilize the o phase. Our work offers a new perspective on enhancing the ferroelectricity of hafnia.
Funder
National Key Research and Development Program of China
National Natural Science Foundation of China
Cited by
1 articles.
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