Ultrathin ferroic HfO2–ZrO2 superlattice gate stack for advanced transistors
Author:
Cheema Suraj S., Shanker NirmaanORCID, Wang Li-ChenORCID, Hsu Cheng-HsiangORCID, Hsu Shang-Lin, Liao Yu-Hung, San Jose Matthew, Gomez Jorge, Chakraborty Wriddhi, Li Wenshen, Bae Jong-HoORCID, Volkman Steve K., Kwon Daewoong, Rho Yoonsoo, Pinelli Gianni, Rastogi Ravi, Pipitone Dominick, Stull Corey, Cook Matthew, Tyrrell Brian, Stoica Vladimir A., Zhang Zhan, Freeland John W., Tassone Christopher J., Mehta ApurvaORCID, Saheli Ghazal, Thompson David, Suh Dong Ik, Koo Won-Tae, Nam Kab-Jin, Jung Dong Jin, Song Woo-Bin, Lin Chung-Hsun, Nam Seunggeol, Heo JinseongORCID, Parihar Narendra, Grigoropoulos Costas P.ORCID, Shafer PadraicORCID, Fay Patrick, Ramesh RamamoorthyORCID, Mahapatra Souvik, Ciston JimORCID, Datta Suman, Mohamed Mohamed, Hu Chenming, Salahuddin Sayeef
Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Reference94 articles.
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