Atomic-Scale Scanning of Domain Network in the Ferroelectric HfO2 Thin Film

Author:

Park Kunwoo12,Kim Dongmin123,Lee Kyoungjun4ORCID,Lee Hyun-Jae5,Kim Jihoon12ORCID,Kang Sungsu12,Lin Alex6,Pattison Alexander J.6,Theis Wolfgang7ORCID,Kim Chang Hoon5,Choi Hyesung12ORCID,Cho Jung Woo4,Ercius Peter6ORCID,Lee Jun Hee5ORCID,Chae Seung Chul4ORCID,Park Jungwon1289ORCID

Affiliation:

1. Center for Nanoparticle Research, Institute for Basic Science (IBS), Seoul 08826, Republic of Korea

2. School of Chemical and Biological Engineering, Institute of Chemical Process, Seoul National University, Seoul 08826, Republic of Korea

3. Samsung Advanced Institute of Technology, Samsung Electronics, Suwon-si, Gyeonggi-do 16678, Republic of Korea

4. Department of Physics Education, Seoul National University, Seoul 08826, Republic of Korea

5. Department of Energy Engineering, School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea

6. National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States

7. Nanoscale Physics Research Laboratory, School of Physics and Astronomy, University of Birmingham, Birmingham B15 2TT, U.K.

8. Institute of Engineering Research, College of Engineering, Seoul National University, Seoul 08826, Republic of Korea

9. Advanced Institute of Convergence Technology, Seoul National University, Suwon-si, Gyeonggi-do 16229, Republic of Korea

Funder

Ministry of Education

National Research Foundation of Korea

Korea Institute for Advancement of Technology

Institute for Basic Science

Lawrence Berkeley National Laboratory

Publisher

American Chemical Society (ACS)

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