The era of hyper-scaling in electronics
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Instrumentation,Electronic, Optical and Magnetic Materials
Link
http://www.nature.com/articles/s41928-018-0117-x.pdf
Reference50 articles.
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4. Chau, R. et al. High-κ metal-gate stack and its MOSFET characteristics. IEEE Electron Dev. Lett. 25, 408–410 (2004).
5. Doyle, B. S. et al. High performance fully-depleted tri-gate CMOS transistors. IEEE Electron Dev. Lett. 24, 263–265 (2003).
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