On-wafer monitoring and control of ion energy distribution for damage minimization in atomic layer etching processes
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
https://iopscience.iop.org/article/10.35848/1347-4065/ab7baa/pdf
Reference33 articles.
1. Digital chemical vapor deposition and etching technologies for semiconductor processing
2. Atomic Layer Etching: Rethinking the Art of Etch
3. Effect of ion-beam irradiation on the epitaxial growth of graphene via the SiC surface decomposition method
4. Threshold defect production in silicon determined by density functional theory molecular dynamics simulations
5. Defect generation and morphology of (001) Si surfaces during low-energy Ar-ion bombardment
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3. Molecular dynamics simulations of silicon nitride atomic layer etching with Ar, Kr, and Xe ion irradiations;Japanese Journal of Applied Physics;2024-07-01
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