Atomic Layer Etching: Rethinking the Art of Etch

Author:

Kanarik Keren J.1ORCID,Tan Samantha1,Gottscho Richard A.1

Affiliation:

1. Lam Research Corporation, Fremont, California 94538, United States

Publisher

American Chemical Society (ACS)

Subject

General Materials Science,Physical and Theoretical Chemistry

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5. Silicon Nitride Surface Modification by Ion Bombardment with Physisorbed Hydrofluorocarbons: Theoretical Assessment;The Journal of Physical Chemistry C;2023-12-05

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