Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope-Reference-Cited by-同舟云学术

Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

Published:2016-07-12 Issue:3 Volume:15 Page:033501
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Benk Markus P.,Wojdyla Antoine,Chao Weilun,Salmassi Farhad,Oh Sharon,Wang Yow-Gwo,Miyakawa Ryan H.,Naulleau Patrick P.,Goldberg Kenneth A.

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Best focus shift mechanism for thick masks

2. EUV and optical lithographic pattern shift at the 5nm node

3. Mask effects for high-NA EUV: impact of NA, chief-ray-angle, and reduction ratio

4. EUV lithography scanner for sub-8nm resolution

5. EUV lithography optics for sub-9nm resolution

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