EUV lithography scanner for sub-8nm resolution-Reference-Cited by-同舟云学术

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EUV lithography scanner for sub-8nm resolution

Published:2015-03-16 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

van Schoot Jan,van Ingen Schenau Koen,Valentin Chris,Migura Sascha

Publisher

SPIE

Reference15 articles.

1. EUV lithography: NXE platform performance overview;van Peeters,2014

2. Interaction of 3D mask effects and NA in EUV lithography;Neumann,2012

3. 3D reticle effects for high NA EUV lithography;Neumann,2012

4. Mask effects for high-NA EUV: impact of NA, chief-ray-angle, and reduction ratio;Neumann,2013

5. Driving the industry towards a consensus on high numerical aperture (high-NA) extreme ultraviolet (EUV);van Kearney,2014

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