Preparing for the Next Generation of EUV Lithography at the Center for X-ray Optics
Author:
Affiliation:
1. Center for X-ray Optics, Berkeley, California, USA
Publisher
Informa UK Limited
Subject
Nuclear and High Energy Physics,Atomic and Molecular Physics, and Optics
Link
https://www.tandfonline.com/doi/pdf/10.1080/08940886.2019.1634432
Reference5 articles.
1. Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging
2. Reconstructing the three-dimensional latent image of extreme ultraviolet resists with resonant soft x-ray scattering
3. Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope
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1. Feasibility study of fabricating 20 nm resolution dielectric Fresnel zone plates with ultrahigh aspect ratio for EUV optics;Microelectronic Engineering;2024-09
2. Feasible Study of Fabricating 20 Nm Resolution Dielectric Fresnel Zone Plates with Ultrahigh Aspect Ratio for Euv Optics;2024
3. Development of an ultra-compact inline transmission grating spectrograph for extreme ultraviolet wavelengths;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21
4. Extreme ultraviolet microscope characterization using photomask surface roughness;Scientific Reports;2020-07-15
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