1. Impact of the EUV mask phase response on the asymmetry of Bossung curves as predicted by rigorous EUV mask simulations;Krautschik,2001
2. Understanding Bossung curve asymmetry and focus shift effect in EUV lithography;Yan,2002
3. Dark field EUVL mask for 45nm technology node poly layer printing;Yan,2002
4. Rizvi, S., ed., [Handbook of Photomask Manufacturing Technology], ch. Masks for Extreme Ultraviolet Lithography, 263–264, CRC Press (2005). http://dx.doi.org/10.1201/9781420028782.
5. Clear sub-resolution assist features for EUV;Burkhardt,2014