Improving exposure latitudes and aligning best focus through pitch by curing M3D phase effects with controlled aberrations-Reference-Cited by-同舟云学术

Improving exposure latitudes and aligning best focus through pitch by curing M3D phase effects with controlled aberrations

Published:2019-09-26 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2019
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Author:

Franke Joern-Holger,Bekaert Joost,Blanco Carballo Victor M.,Van Look Lieve,Wahlisch Felix,Lyakhova Kateryna,van Adrichem Paul,Maslow Mark J.,Schiffelers Guido,Hendrickx Eric

Publisher

SPIE

Reference26 articles.

1. Current challenges and opportunities for EUV lithography

2. EUV industrialization high volume manufacturing with NXE3400B

3. Electrical comparison of iN7 EUV hybrid and EUV single patterning BEOL metal layers

4. Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

5. Mask-induced best-focus shifts in deep ultraviolet and extreme ultraviolet lithography

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