EUV industrialization high volume manufacturing with NXE3400B-Reference-Cited by-同舟云学术

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EUV industrialization high volume manufacturing with NXE3400B

Published:2018-10-03 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2018
language:
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Author:

Mastenbroek Marcel

Publisher

SPIE

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Extreme ultraviolet pellicle wrinkles influence on mask 3D effects: experimental demonstration;Applied Optics;2023-08-11

2. Investigating the Degradation of EUV Transmittance of an EUV Pellicle Membrane;Membranes;2022-12-21

3. Effect of wrinkles on extreme ultraviolet pellicle reflectivity and local critical dimension;Applied Optics;2022-07-05

4. Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography;Membranes;2022-03-26

5. Toward the realization of subsurface volumetric integrated optical systems;Applied Physics Letters;2021-09-27

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