Current challenges and opportunities for EUV lithography-Reference-Cited by-同舟云学术

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Current challenges and opportunities for EUV lithography

Published:2018-10-24 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2018
language:
Short-container-title:

Author:

Levinson Harry J.,Brunner Timothy A.

Publisher

SPIE

Reference22 articles.

1. EUV lithography: An historical perspective;Kinoshita,2018

2. I. V. Fomenkov, D. C. Brandt, A. I. Ershov, A. A. Schafgans, Y. Tao, G. O. Vaschenko, and B. La Fontain, “EUV sources for high-volume manufacturing,” Chapter 3A: 109–163; and

3. High-power EUV source by Gigaphoton for high-volume manufacturing;Mizoguchi,2018

4. Pellicle for use in EUV lithography and a method of making such a pellicle;Levinson;U.S. Patent 6,623,893,2003

5. Progress on EUV pellicle development;Zoldesi,2014

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