Effect of Cl<sub>2</sub> Radical on Dry Development of Spin-Coated Metal Oxide Resist-Reference-Cited by-同舟云学术

Effect of Cl₂ Radical on Dry Development of Spin-Coated Metal Oxide Resist

Published:2024-09-12 Issue: Volume: Page:
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Namgoong Soo¹^ORCID,Kim Hee Ju¹^ORCID,Kang Yeo Kyung¹,Kim Min Cheol²,Jang Yun Jong¹,Tak Hyunwoo¹,Kang Ji Eun¹,Lee Sun Jin¹,Kim Myung-Gil¹^ORCID,Kim Dongwoo¹,Yeom Geun Young¹³^ORCID

Affiliation:

1. School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 16419, Korea

2. Interdisciplinary Program in Photovoltaic System Engineering, Sungkyunkwan University, Suwon 16419, Korea

3. SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, Suwon 16419, Korea

Funder

National Research Foundation of Korea

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.4c10523

Reference36 articles.

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2. Extreme ultraviolet resist materials for sub-7 nm patterning

3. High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results

4. Review of recent advances in inorganic photoresists

5. Kawakami, S.; Onitsuka, T.; Kamei, Y.; Shimura, S.; Park, C. H.; Lee, S. H.; Lee, H. G.; Seo, J. W.; Kim, J.; Roh, J.; Kim, J. H.; Lee, K. L.; Nagahara, S.; Kim, J. Y.; Kim, J. H.; Inaba, S.; Park, J. E. Metal Oxide Resist (MOR) EUV Lithography Processes for DRAM Application. Proceedings, Advances in Patterning Materials and Processes, Vol. 12055; SPIE, 2022; p 120550N.10.1117/12.2613974.