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2. Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorbed;Devesh;J. Micro,2023
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4. Mask is key to unlock full EUVL potential;Philipsen;Proc. SPIE 11609,2021
5. Imaging validation for LS of dark field low-n vs. Ta-based absorber masks;Kovalevich;Proc. SPIE 12750,2023