Experimental verification of high-NA imaging simulations using SHARP-Reference-Cited by-同舟云学术

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Experimental verification of high-NA imaging simulations using SHARP

Published:2020-10-16 Issue: Volume: Page:
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Container-title:Extreme Ultraviolet Lithography 2020
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Author:

Davydova Natalia V.,Liu Fei,Benk Markus,van Setten Eelco,Bottiglieri Gerardo,van Oosten Anton,McNamara John,Wiaux Vincent,Franke Joern-Holger,Goldberg Kenneth,Nam Dong-Seok,Zekry Joseph,Naulleau Patrick,Fliervoet Timon,Carpaij Rene

Publisher

SPIE

Reference9 articles.

1. High-NA EUV lithography enabling Moore’s law in the next decade;van Schoot,2017

2. High-NA EUV lithography: pushing the limits

3. High NA EUV lithography: Next step in EUV imaging;van Setten,2019

4. Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography;van Setten,2017

5. An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm;Goldberg,2011

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Resist line edge roughness mitigation at high-NA EUVL;Advances in Patterning Materials and Processes XXXIX;2022-05-25

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