Phase-independent multilayer defect repair for EUV photomasks

Author:

Zhao Shuo1,Qi Zhengqing John1

Affiliation:

1. GLOBALFOUNDRIES Inc. (United States)

Publisher

SPIE

Reference35 articles.

1. EUV lithography performance for manufacturing: status and outlook,;Pirati,2016

2. EUV Photomask Defects: What prints, what doesn’t, and what is required for HVM,;Rankin,2015

3. Printability of buried extreme ultraviolet lithography photomask defects

4. EUV mask and wafer defectivity: strategy and evaluation for full die defect inspection,;Bonam,2016

5. Toward defect-free fabrication of extreme ultraviolet photomasks

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