Introduction of pre-etch deposition techniques in EUV patterning-Reference-Cited by-同舟云学术

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Introduction of pre-etch deposition techniques in EUV patterning

Published:2018-04-09 Issue: Volume: Page:
ISSN:
Container-title:Advanced Etch Technology for Nanopatterning VII
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Author:

Xiang Xun,Labonte Andre,Labelle Catherine,Nagabhirava Bhaskar,Friddle Phil,Schmitz Stefan,Goss Michael,Metzler Dominik,Arnold John C.,Beique Genevieve,Sun Lei

Publisher

SPIE

Reference20 articles.

1. EUV Patterning Successes and Frontiers;Felix,2016

2. Design intent optimization at the beyond 7nm node: the intersection of DTCO and EUVL stochastic mitigation techniques;Crouse,2017

3. Phase-independent multilayer defect repair for EUV photomasks;Zhao,2016

4. Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs;Kim,2016

5. Dry etching challenges for patterning smooth lines: LWR reduction of extreme ultra violet photo resist;Altamirano-Sánchez,2012

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dual tone sub-resolution assist features to improve corner rounding;Optical Microlithography XXXIII;2020-04-17

2. Stochastic printing failures in extreme ultraviolet lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-09-25

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