Toward defect-free fabrication of extreme ultraviolet photomasks-Reference-Cited by-同舟云学术

Toward defect-free fabrication of extreme ultraviolet photomasks

Published:2016-04-12 Issue:2 Volume:15 Page:023502
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Qi Zhengqing John¹,Rankin Jed H.²,Lawliss Mark²,Badger Karen D.²,Turley Christina²

Affiliation:

1. GLOBALFOUNDRIES Inc., 257 Fuller Road, Albany, New York 12203, United States

2. GLOBALFOUNDRIES Inc., 1000 River Street, Essex Junction, Vermont 05954, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference35 articles.

1. Silicon Device Scaling to the Sub-10-nm Regime

2. Performance overview and outlook of EUV lithography systems

3. Masks for micro- and nanolithography;Gallagher,2014

4. Study of real defects on EUV blanks and a strategy for EUV mask inspection

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1. Defect repairs for the extreme ultraviolet mask;Extreme Ultraviolet (EUV) Lithography XII;2021-02-21

2. Free energy of defects in chemoepitaxial block copolymer directed self-assembly: effect of pattern density and defect position;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-10-20

3. Compact linac-driven light sources utilizing mm-period RF undulators;Advances in Laboratory-based X-Ray Sources, Optics, and Applications VI;2017-08-23

4. Overcoming EUV mask blank defects: what we can, and what we should;SPIE Proceedings;2017-07-13

5. EUV mask defectivity – a process of increasing control toward HVM;Advanced Optical Technologies;2017-01-01