Holistic analysis of aberration induced overlay error in EUV lithography

Author:

Chen Yulu,Liebmann Lars,Sun Lei,Gabor Allen H.,Zhao Shuo,Luo Feixiang,Wood Obert R.,Chen Xuemei,Schmidt Daniel,Kling Michael,Goodwin Francis

Publisher

SPIE

Reference34 articles.

1. EUV interferometric testing and alignment of the 0.3-NA MET optic;Goldberg,2004

2. Optimum mask and source patterns to print a given shape

3. EUV resolution enhancement techniques (RETs) for k1 0.4 and below;Hsu,2015

4. Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs;Kim,2016

5. Tip-to-tip variation mitigation in extreme ultraviolet lithography for 7 nm and beyond metallization layers and design rule analysis

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