Development of a probe-type optical absorption spectroscopic system for spatially resolved CF2 density measurement in inductively coupled C4F8/Ar plasmas-Reference-Cited by-同舟云学术

Development of a probe-type optical absorption spectroscopic system for spatially resolved CF2 density measurement in inductively coupled C4F8/Ar plasmas

Published:2020-01-01 Issue:1 Volume:91 Page:013504
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Han Jonggu¹,Cho Deog Gyun¹^ORCID,Mauchauffé Rodolphe²,Moon Se Youn¹²^ORCID

Affiliation:

1. Department of Applied Plasma and Quantum Beam Engineering, Chonbuk National University, 567 Baekje-daero, Deokjin-gu, Jeonju-si, Jeollabuk-do, South Korea

2. Department of Quantum System Engineering, Chonbuk National University, 567 Baekje-daero, Deokjin-gu, Jeonju-si, Jeollabuk-do, South Korea

Funder

National Research Foundation of Korea

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5136284

Reference28 articles.

1. Polymerization for Highly Selective SiO2Plasma Etching

2. A Surface Kinetic Model for Plasma Polymerization with Application to Plasma Etching

3. CF2 production and loss mechanisms in fluorocarbon discharges: Fluorine-poor conditions and polymerization

4. In situ Auger electron spectroscopy of Si and SiO2 surfaces plasma etched in CF4-H2 glow discharges

5. Plasma-assisted etching

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1. The role of nitrogen addition in C4F8/Ar plasma to modulate the plasma process from polymerization to etching;Vacuum;2023-10

2. Importance of higher‐level excited species in argon remote plasma sources: Numerical modeling with consideration of detailed chemical reaction pathways;Plasma Processes and Polymers;2022-03-24