A Surface Kinetic Model for Plasma Polymerization with Application to Plasma Etching-Reference-Cited by-同舟云学术

A Surface Kinetic Model for Plasma Polymerization with Application to Plasma Etching

Published:1990-08-01 Issue:8 Volume:137 Page:2575-2581
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Bariya Anand J.¹²³,Frank Curtis W.¹²³,McVittie James P.¹²³

Affiliation:

1. Department of Chemical Engineering and Center for Integrated Systems, Stanford University, Stanford, California 94305

2. Department of Chemical Engineering, Stanford University, Stanford, California 94305

3. Center for Integrated Systems, Stanford University, Stanford, California 94305

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2086989/pdf

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