Importance of higher‐level excited species in argon remote plasma sources: Numerical modeling with consideration of detailed chemical reaction pathways-Reference-Cited by-同舟云学术

Importance of higher‐level excited species in argon remote plasma sources: Numerical modeling with consideration of detailed chemical reaction pathways

Published:2022-03-24 Issue:6 Volume:19 Page:2100251
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Processes & Polymers

Author:

Cheon Cheongbin¹^ORCID,Yoon Jung Hwan²³,Jo Sanghyun³,Kim Ho Jun³^ORCID,Lee Hae June⁴^ORCID

Affiliation:

1. Department of Electrical and Electronics Engineering Pusan National University Busan South Korea

2. Department of Mechanical Engineering Dong‐A University Busan South Korea

3. Department of Mechanical Engineering Gachon University Seongnam South Korea

4. Department of Electrical Engineering Pusan National University Busan South Korea

Funder

Ministry of Trade, Industry and Energy

National Research Foundation of Korea

National Research Council of Science and Technology

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/ppap.202100251

Reference61 articles.

1. Studies on surface properties of polyethersulfone membrane by remote argon plasma

2. J.‐P.Booth D. L.Keil US 2010/0006417 A1 2010.

3. Production and transport chemistry of atomic fluorine in remote plasma source and cylindrical reaction chamber

4. Two-step cycling process alternating implantation and remote plasma etching for topographically selective etching: Application to Si3N4 spacer etching

5. Precise ion energy control with tailored waveform biasing for atomic scale processing

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