Bombardment energies of O2+in low pressure reactive ion etching
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.107963
Reference9 articles.
1. Oxygen reactive ion etching of polymers: profile evolution and process mechanisms
2. Measurement of ion energy distributions at the powered rf electrode in a variable magnetic field
3. Measurement of ion impact energy and ion flux at the rf electrode of a parallel plate reactive ion etcher
4. Sheath collision processes controlling the energy and directionality of surface bombardment in O2reactive ion etching
5. Structured ion energy distribution in radio frequency glow‐discharge systems
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2. Retarding Field Analyzer for Ion Energy Distribution Measurement Through a Radio-Frequency or Pulsed Biased Sheath;Plasma Processes and Polymers;2009-06
3. Comparison of plasma parameters determined with a Langmuir probe and with a retarding field energy analyzer;Plasma Sources Science and Technology;2008-07-31
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