Tunable Hydrogen-Related Defects in ZnO Nanowires Using Oxygen Plasma Treatment by Ion Energy Adjustment

Author:

Dieulesaint Alexandre1,Chaix-Pluchery Odette1,Weber Matthieu1,Donatini Fabrice2,Lacoste Ana3,Consonni Vincent1ORCID,Sarigiannidou Eirini1ORCID

Affiliation:

1. Université Grenoble Alpes, CNRS, Grenoble INP, LMGP, F-38000 Grenoble, France

2. Université Grenoble Alpes, CNRS, Grenoble INP, Institut NEEL, F-38000 Grenoble, France

3. Université Grenoble Alpes, CNRS, Grenoble INP, LPSC-IN2P3, F-38000 Grenoble, France

Abstract

The chemical bath deposition (CBD) process enables the deposition of ZnO nanowires (NWs) on various substrates with customizable morphology. However, the hydrogen-rich CBD environment introduces numerous hydrogen-related defects, unintentionally doping the ZnO NWs and increasing their electrical conductivity. The oxygen-based plasma treatment can modify the nature and amount of these defects, potentially tailoring the ZnO NW properties for specific applications. This study examines the impact of the average ion energy on the formation of oxygen vacancies (VO) and hydrogen-related defects in ZnO NWs exposed to low-pressure oxygen plasma. Using X-ray photoelectron spectroscopy (XPS), 5 K cathodoluminescence (5K CL), and Raman spectroscopy, a comprehensive understanding of the effect of the oxygen ion energy on the formation of defects and defect complexes was established. A series of associative and dissociative reactions indicated that controlling plasma process parameters, particularly ion energy, is crucial. The XPS data suggested that increasing the ion energy could enhance Fermi level pinning by increasing the amount of VO and favoring the hydroxyl group adsorption, expanding the depletion region of charge carriers. The 5K CL and Raman spectroscopy further demonstrated the potential to adjust the ZnO NW physical properties by varying the oxygen ion energy, affecting various donor- and acceptor-type defect complexes. This study highlights the ability to tune the ZnO NW properties at low temperature by modifying plasma process parameters, offering new possibilities for a wide variety of nanoscale engineering devices fabricated on flexible and/or transparent substrates.

Funder

French National Research Agency

Centre of Excellence of Multifunctional Architectured Materials

Publisher

MDPI AG

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