Measurement of ion impact energy and ion flux at the rf electrode of a parallel plate reactive ion etcher
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.347311
Reference46 articles.
1. Positive‐ion bombardment of substrates in rf diode glow discharge sputtering
2. Ion response to plasma excitation frequency
3. Frequency dependence of ion bombardment of grounded surfaces in rf argon glow discharges in a planar system
4. Effects of frequency on optical emission, electrical, ion, and etching characteristics of a radio frequency chlorine plasma
5. Energy Distribution of Ions in Plasma Etching Reactors
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