Measurement of ion energy distributions at the powered rf electrode in a variable magnetic field
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.345721
Reference34 articles.
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2. The design of plasma etchants
3. Near‐Surface Damage and Contamination after CF 4 / H 2 Reactive Ion Etching of Si
4. Rutherford backscattering studies of plasma‐etched silicon
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