450 mm dual frequency capacitively coupled plasma sources: Conventional, graded, and segmented electrodes
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3517104
Reference19 articles.
1. Self-consistent simulation of very high frequency capacitively coupled plasmas
2. High selectivity plasma etching of silicon dioxide with a dual frequency 27/2 MHz capacitive radio frequency discharge
3. Control of plasma uniformity in a capacitive discharge using two very high frequency power sources
4. Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas
5. Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma
Cited by 51 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Role of gas composition in weakened nonlinear standing wave excitation and improved plasma radial uniformity in very-high-frequency asymmetric capacitive Ar/CF4 discharges;Journal of Physics D: Applied Physics;2024-05-02
2. Effects of low-frequency voltage on nonlinear standing wave excitation, plasma uniformity, and ion dynamics in dual-frequency asymmetric capacitive discharges;Plasma Sources Science and Technology;2024-04-01
3. The Discharge Characteristics of Capacitively Coupled Ar Plasma as the Change of Pressure;Plasma Physics Reports;2023-06
4. Standing wave instability in large area capacitive discharges operated within or near the gamma mode;Plasma Sources Science and Technology;2022-11-01
5. Nonlinear transmission line (NTL) model study of electromagnetic effects in high-frequency asymmetrically driven capacitive discharges;Physics of Plasmas;2022-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3