Control of plasma uniformity in a capacitive discharge using two very high frequency power sources
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3183946
Reference18 articles.
1. Principles of Plasma Discharges and Materials Processing
2. Verification of frequency scaling laws for capacitive radio‐frequency discharges using two‐dimensional simulations*
3. Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources
4. Frequency optimization for capacitively coupled plasma source
5. Standing wave and skin effects in large-area, high-frequency capacitive discharges
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