Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.127020
Reference11 articles.
1. Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing
2. Verification of frequency scaling laws for capacitive radio‐frequency discharges using two‐dimensional simulations*
3. A computational investigation of the RF plasma structures and their production efficiency in the frequency range from HF to VHF
4. Effect of supplied substrate bias frequency in ultrahigh‐frequency plasma discharge for precise etching processes
5. Dual excitation reactive ion etcher for low energy plasma processing
Cited by 222 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Particle-in-cell simulations of high frequency capacitively coupled plasmas including spatially localised inductive-like heating;Plasma Sources Science and Technology;2023-12-01
2. Modeling of plasma processing reactors: review and perspective;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-11-22
3. Numerical and experimental study of ion energy distribution function in a dual-frequency capacitively coupled oxygen discharge;Plasma Sources Science and Technology;2023-11-01
4. Influence of external circuitry on CF4 breakdown process in capacitively coupled plasma;Journal of Vacuum Science & Technology B;2023-09-01
5. Spatial flux and energy asymmetry in a low pressure capacitively coupled plasma discharge excited by sawtooth waveform: A harmonic study;Physics of Plasmas;2023-07-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3