Characterization of traps in InAlN by optically and thermally stimulated deep level defect spectroscopies
Author:
Affiliation:
1. Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210, USA
2. Materials Department, University of California, Santa Barbara, California 93106, USA
Funder
Directorate for Engineering
Office of Naval Research
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/am-pdf/10.1063/1.5050949
Reference42 articles.
1. Temperature Dependent Capacitance–Voltage Analysis of Unintentionally Doped and Si Doped Al0.82In0.18N Grown on GaN
2. Capacitance behavior of InAlN Schottky diodes in presence of large concentrations of shallow and deep states related to oxygen
3. Pyroelectric properties of Al(In)GaN/GaN hetero- and quantum well structures
4. Polarization Effects in Semiconductors
5. Photocapacitance spectroscopy of InAlN nearly lattice-matched to GaN
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1. Sub-bandgap optical absorption processes in 300-nm-thick Al1−xInxN alloys grown on a c-plane GaN/sapphire template;Journal of Applied Physics;2024-01-17
2. Photo- and electro-luminescence studies of semipolar ( 11 2 ¯ 2 ) InxAl1−xN;Journal of Applied Physics;2020-07-28
3. Influence of neutron irradiation on deep levels in Ge-doped (010) β-Ga2O3 layers grown by plasma-assisted molecular beam epitaxy;APL Materials;2019-12-01
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