Sub-bandgap optical absorption processes in 300-nm-thick Al1−xInxN alloys grown on a c-plane GaN/sapphire template

Author:

Imai Daichi1ORCID,Murakami Yuto1,Toyoda Hayata1,Noda Kouki1,Masaki Kyosuke1,Kubo Kazutoshi1,Nomura Mayu1,Miyoshi Makoto2ORCID,Miyajima Takao1,Takeuchi Tetsuya1ORCID

Affiliation:

1. Faculty of Science and Technology, Meijo University 1 , 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 463-8502, Japan

2. Research Center for Nano Devices and Advanced Materials, Nagoya Institute of Technology 2 , Gokiso-cho, Showa-ku, Nagoya 466-8555, Japan

Abstract

We investigate the sub-bandgap optical absorption (SOA) in 300-nm-thick Al1−xInxN alloys used in cladding layers of edge-emitting laser diodes and distributed Bragg reflectors of vertical-cavity surface-emitting lasers. Al1−xInxN alloys, with indium content x ranging from 0.114 to 0.185, were grown by metal-organic chemical vapor deposition on a c-plane GaN/sapphire template. SOAs on 300-nm-thick thin films were characterized using photothermal deflection spectroscopy (PDS). Thermal emission, such as nonradiative recombination with phonon emission, is the dominant energy relaxation process occurring after SOA in Al1−xInxN alloys. The absorption coefficient of the SOA was estimated to be 0.6–7.0 × 103 cm−1 in these samples by combining PDS and spectroscopic ellipsometry. The drastic increase in the SOA, when x exceeded the lattice-matched composition of the GaN/sapphire template, indicates that impurities, vacancy-type defects, and their complexes with increasing x are possible candidates that result in SOA in Al1−xInxN alloys.

Funder

Japan Society for the Promotion of Science

Naito Science and Engineering Foundation

Nitto

Toyota Riken Scholar

Program for research and development of next-generation semiconductor to realize energy-saving society

Publisher

AIP Publishing

Subject

General Physics and Astronomy

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