Nanometer scale electron beam lithography in inorganic materials
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.95115
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4. In situ vaporization of very low molecular weight resists using 1/2 nm diameter electron beams
5. Fabrication of apertures, slots, and grooves at the 8–80 nm scale in silicon and metal films
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