Electron beam writing on a 20‐Å scale in metal β‐aluminas
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.93918
Reference4 articles.
1. 50−nm silicon structures fabricated with trilevel electron beam resist and reactive‐ion etching
2. In situ vaporization of very low molecular weight resists using 1/2 nm diameter electron beams
3. Direct measurement of contamination and etching rates in an electron beam
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