Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning-Reference-Cited by-同舟云学术

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Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning

Published:2022-06-02 Issue:04 Volume:21 Page:
ISSN:2708-8340
Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
language:
Short-container-title:J. Micro/Nanopattern. Mats. Metro.

Author:

Saifullah Mohammad S. M.¹,Tiwale Nikhil²,Ganesan Ramakrishnan³

Affiliation:

1. Paul Scherrer Institute, Laboratory for Micro- and Nanotechnology, Villigen

2. Brookhaven National Laboratory, Center for Functional Nanomaterials, Upton, New York

3. Birla Institute of Technology and Science Pilani, Department of Chemistry, Hyderabad, Telangana

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Arts and Humanities

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da);ACS Nano;2024-08-20

2. The importance of less damaged and surface sensitive metrology to identify true EUV process monitoring;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

3. Indium nitrate hydrate films as potential EUV resists: film formation, characterization, and solubility switch assessment using a 92-eV electron beam;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-01-02

4. Chemically amplified molecular resins for shrinkage-controlled direct nanoimprint lithography of functional oxides: an application towards dark-light dual-mode antibacterial surfaces;Materials Advances;2024

5. Organometallic and coordinative photoresist materials for EUV lithography and related photolytic mechanisms;Coordination Chemistry Reviews;2023-10

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