Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da)

Author:

Saifullah Mohammad S.M.12ORCID,Rajak Anil Kumar1,Hofhuis Kevin A.1,Tiwale Nikhil3ORCID,Mahfoud Zackaria4,Testino Andrea15ORCID,Karadan Prajith1,Vockenhuber Michaela1,Kazazis Dimitrios1ORCID,Valiyaveettil Suresh6ORCID,Ekinci Yasin1ORCID

Affiliation:

1. Paul Scherrer Institut, Forschungsstrasse 111, Villigen PSI 5232, Switzerland

2. PiBond Oy, Kutojantie 2B, Espoo 02630, Finland

3. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973-5000, United States of America

4. Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology, and Research), 2 Fusionopolis Way, #08-03 Innovis, Singapore 138634, Republic of Singapore

5. École Polytechnique Fédérale de Lausanne, STI SMX-GE, Lausanne CH 1015, Switzerland

6. Department of Chemistry, National University of Singapore, 3 Science Drive 3, Singapore 117543, Republic of Singapore

Publisher

American Chemical Society (ACS)

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