Indium nitrate hydrate films as potential EUV resists: film formation, characterization, and solubility switch assessment using a 92-eV electron beam
Author:
Affiliation:
1. University of Texas at Dallas, Department of Materials Science and Engineering, Richardson, Texas, United States
2. University of Texas at Dallas, Department of Chemistry, Richardson, Texas, United States
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Arts and Humanities
Reference25 articles.
1. Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet
2. Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
3. Study on deprotonation from radiation-induced ionized acrylate polymers including acid-generation promoters for improving chemically amplified resists
4. Sensitivity enhancement of chemically amplified EUV resists by adding acid-generating promoters
5. Extreme ultraviolet patterning of tin-oxo cages
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