Indium nitrate hydrate films as potential EUV resists: film formation, characterization, and solubility switch assessment using a 92-eV electron beam-Reference-Cited by-同舟云学术

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Indium nitrate hydrate films as potential EUV resists: film formation, characterization, and solubility switch assessment using a 92-eV electron beam

Published:2024-01-02 Issue:01 Volume:23 Page:
ISSN:2708-8340
Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
language:
Short-container-title:J. Micro/Nanopattern. Mats. Metro.

Author:

Grayson Jesse L.¹,Valdez Marisol²,Xu Weijie¹,Hsu Julia W. P.¹

Affiliation:

1. University of Texas at Dallas, Department of Materials Science and Engineering, Richardson, Texas, United States

2. University of Texas at Dallas, Department of Chemistry, Richardson, Texas, United States

Publisher

SPIE-Intl Soc Optical Eng

Reference25 articles.

1. Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet

2. Absorption coefficient of metal-containing photoresists in the extreme ultraviolet

3. Study on deprotonation from radiation-induced ionized acrylate polymers including acid-generation promoters for improving chemically amplified resists

4. Sensitivity enhancement of chemically amplified EUV resists by adding acid-generating promoters

5. Extreme ultraviolet patterning of tin-oxo cages

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