High resolution electron beam lithography on CaF2
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.94769
Reference4 articles.
1. 250‐Å linewidths with PMMA electron resist
2. In situ vaporization of very low molecular weight resists using 1/2 nm diameter electron beams
3. Thin‐film CaF2inorganic electron resist and optical‐read storage medium
4. Formation of an Epitaxial Si/Insulator/Si Structure by Vacuum Deposition of CaF2and Si
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