Laser damage mechanism and in situ observation of stacking fault relaxation in a β-Ga2O3 single crystal by the EFG method

Author:

Fu Bo12345,He Gaohang6784,Mu Wenxiang1234,Li Yang1234,Feng Boyuan6784,Zhang Kaihui910114,Wang Huanyang1234,Zhang Jin1234,Zhang Shaojun1234,Jia Zhitai123412ORCID,Shi Yujun5131415ORCID,Li Yanbin121641718,Ding Sunan6784,Tao Xutang123419ORCID

Affiliation:

1. State Key Laboratory of Crystal Materials

2. Shandong University

3. Jinan

4. China

5. Department of Chemistry

6. Suzhou Institute of Nano-Tech and Nano-Bionics

7. Chinese Academy of Sciences

8. Suzhou 215 123

9. School of Materials Science and Engineering

10. Taiyuan University of Technology

11. Taiyuan 030024

12. Jiangsu Xiyi Advanced Materials Research Institute of Industrial Technology

13. University of Calgary

14. Calgary

15. Canada

16. Xuzhou

17. Jiangsu Key Laboratory of Advanced Laser Materials and Devices, School of Physics and Electronic Engineering

18. Jiangsu Normal University

19. Shenzhen Research Institute of Shandong University

Abstract

We for the first time built up a laser damage mechanism and in situ observed stacking fault relaxation in a β-Ga2O3 single crystal.

Funder

National Natural Science Foundation of China

National Basic Research Program of China

Key Technology Research and Development Program of Shandong

International Science and Technology Cooperation Program of Jiangsu Province

Special Project for Research and Development in Key areas of Guangdong Province

Higher Education Discipline Innovation Project

Publisher

Royal Society of Chemistry (RSC)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

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