Delayed crystallization of ultrathin Gd2O3 layers on Si(111) observed by in situ X-ray diffraction
Author:
Publisher
Springer Science and Business Media LLC
Subject
Condensed Matter Physics,General Materials Science
Link
http://link.springer.com/content/pdf/10.1186/1556-276X-7-203.pdf
Reference15 articles.
1. Chang WH, Lee CH, Chang YC, Chang P, Huang ML, Lee YJ, Hsu CH, Hong JM, Tsai CC, Kwo JR, Hong M: Nanometer-thick single-crystal hexagonal Gd-23on GaN for advanced complementary metal-oxide-semiconductor technology. Adv Mater 2009, 21: 4970. 10.1002/adma.200902101
2. Mahajan SV, Dickerson JH: Dielectric properties of colloidal Gd-23nanocrystal films fabricated via electrophoretic deposition. Appl Phys Lett 2010, 96: 113105. 10.1063/1.3359418
3. Kwo J, Hong M, Kortan AR, Queeney KT, Chabal YJ, Mannaerts JP, Boone T, Krajewski JJ, Sergent AM, Rosamilia JM: High epsilon gate dielectrics Gd-23and Y-23for silicon. Appl Phys Lett 2000, 77: 130. 10.1063/1.126899
4. Badylevich M, Shamuilia S, Afanas'ev VV, Laha A, Osten JH, Fissel A: Investigation of the electronic structure at interfaces of crystalline and amorphous Gd-23thin layers with silicon substrates of different orientations. Appl Phys Lett 2007, 90: 252101. 10.1063/1.2746419
5. Hubbard KJ, Schlom DG: Thermodynamic stability of binary oxides in contact with silicon. J Mater Res 1996, 11: 2757. 10.1557/JMR.1996.0350
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