High ε gate dielectrics Gd2O3 and Y2O3 for silicon-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

High ε gate dielectrics Gd2O3 and Y2O3 for silicon

Published:2000-07-03 Issue:1 Volume:77 Page:130-132
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Kwo J.,Hong M.,Kortan A. R.,Queeney K. T.,Chabal Y. J.,Mannaerts J. P.,Boone T.,Krajewski J. J.,Sergent A. M.,Rosamilia J. M.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.126899

Reference15 articles.

1. Thermodynamic stability of binary oxides in contact with silicon

2. MOSFET transistors fabricated with high permitivity TiO/sub 2/ dielectrics

3. Electrical properties of hafnium silicate gate dielectrics deposited directly on silicon

4. Stable zirconium silicate gate dielectrics deposited directly on silicon

5. Low interface state density oxide-GaAs structures fabricated by in situ molecular beam epitaxy

Cited by 252 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dielectric breakdown of oxide films in electronic devices;Nature Reviews Materials;2024-08-07

2. Enhancing power conversion efficiency of polycrystalline silicon photovoltaic cells using yttrium oxide anti-reflective coating via electro-spraying method;Ceramics International;2024-08

3. Electrically sign-reversible topological Hall effect in a top-gated topological insulator (Bi,Sb)2Te3 grown on europium iron garnet;Physical Review B;2024-01-26

4. Modification of stability properties of yttrium(III) oxide particles by simultaneous adsorption of poly(acrylic acid) and poly(ethylene glycol) for possible applications in wastewater treatment;Clean Technologies and Environmental Policy;2023-11-09

5. Ultrahigh Vacuum Annealing of Atomic-Layer-Deposited Y₂O₃/GaAs in Perfecting Heterostructural Chemical Bonding for Effective Passivation;ACS Applied Electronic Materials;2023-07-13

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3