NH3and NO interaction with Si(100)-(2×1) surfaces
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.44.1954/fulltext
Reference26 articles.
1. Electronic structure of hydrogenated and unhydrogenated amorphousSiNx (0≤x≤1.6): A photoemission study
2. Chemical composition of soft vacuum electron beam assisted chemical vapor deposition of silicon nitride/oxynitride films versus substrate temperature
3. Reaction of Si(100) with NH3: Rate-Limiting Steps and Reactivity Enhancement via Electronic Excitation
4. Photoemission studies of the reactions of ammonia and N atoms with Si(100)-(2×1) and Si(111)-(7×7) surfaces
5. Imaging chemical-bond formation with the scanning tunneling microscope:NH3dissociation on Si(001)
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