Photoemission studies of the reactions of ammonia and N atoms with Si(100)-(2×1) and Si(111)-(7×7) surfaces
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.38.3937/fulltext
Reference28 articles.
1. Thermal Nitridation of Si and SiO/sub 2/ for VLSI
2. Reaction of Si(100) with NH3: Rate-Limiting Steps and Reactivity Enhancement via Electronic Excitation
3. Photoemission study of ammonia dissociation on Si(100) below 700 K
4. Low temperature NH3 adsorption on clean amorphous silicon and on crystalline silicon surfaces and nitrogen bonding in hydrogenated amorphous silicon nitride films: A comparative X-ray photoelectron spectroscopy study
5. Si-H bond production by NH3 adsorption on Si(111): An UPS study
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