Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor
Author:
Affiliation:
1. Department of Applied Physics, Eindhoven University of Technology, Post Office Box 513, 5600 MB Eindhoven, Netherlands
2. Department of Chemical and Environmental Engineering, Universidad Técnica Federico Santa Mariá, Santiago 2340000, Chile
Funder
Intel Corporation
H2020 European Research Council
Nederlandse Organisatie voor Wetenschappelijk Onderzoek
Agencia Nacional de Investigaci?n y Desarrollo
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.2c03214
Reference52 articles.
1. Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition
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5. Perspective: New process technologies required for future devices and scaling
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