Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition-Reference-Cited by-同舟云学术

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Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition

Published:2021-09-22 Issue:39 Volume:37 Page:11637-11645
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Liu Tzu-Ling¹^ORCID,Zeng Li²^ORCID,Nardi Katie L.³,Hausmann Dennis M.³,Bent Stacey F.¹²^ORCID

Affiliation:

1. Department of Materials Science and Engineering, Stanford University, 496 Lomita Mall, Stanford, California 94305, United States

2. Department of Chemical Engineering, Stanford University, 443 Via Ortega, Stanford, California 94305, United States

3. Lam Research Corporation, 4650 Cushing Parkway, Fremont, California 94538, United States

Funder

U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences

National Science Foundation

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.1c02211

Reference42 articles.

1. Area-Selective ALD with Soft Lithographic Methods: Using Self-Assembled Monolayers to Direct Film Deposition

2. The use of atomic layer deposition in advanced nanopatterning

3. A brief review of atomic layer deposition: from fundamentals to applications

4. Area-Selective ALD of TiO2 Nanolines with Electron-Beam Lithography

5. Area Selective Atomic Layer Deposition of Cobalt Thin Films

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1. Research progress on the preparation of irradiation-resistant coating based on PVD technology;Journal of Materials Research and Technology;2024-09

2. Area-selective atomic layer deposition (AS-ALD) of low temperature (300 °C) cobalt thin film using octadecyltrichlorosilane (ODTS) self-assembled monolayers (SAMs);Applied Surface Science;2024-08

3. Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms;Nanomaterials;2024-07-16

4. Selective Atomic Layer Deposition of Co Thin Films Using Co(EtCp)2 Precursor;Korean Journal of Materials Research;2024-03-27

5. Inhibition of atomic layer deposition of TiO2 by functionalizing silicon surface with 4-fluorophenylboronic acid;Journal of Vacuum Science & Technology A;2024-03-11

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